Nominations for the 3rd Annual Excellence Award from the North American Chemical Residue Workshop (NACRW) are now open.
Nominations for the 3rd Annual Excellence Award from the North American Chemical Residue Workshop (NACRW) are now open. This year’s award will focus on Excellence in Separation Science and aims to recognize the scientist who has made the most impactful contributions to separation science techniques relevant to chemical residue analysis.
Nominations will be taken until March 31st, 2017, and the award will be presented in Naples, Florida, USA, at the 54th annual NACRW, July 23–26, 2017.
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Vol 13 No 1 The Column January 17, 2017 North American PDF
